CHARGED PARTICLE BEAM WRITING DEVICE, CHARGED PARTICLE BEAM WRITING METHOD AND METHOD FOR ADJUSTING INCIDENCE ANGLE OF BEAM TO SURFACE OF SAMPLE

摘要

A charged particle beam writing apparatus according to an aspect of the present invention includes an emission unit to emit a charged particle beam; an electron lens to converge the charged particle beam; a blanking deflector which is arranged at the back of the electron lens in the direction of an optical axis and deflects the charged particle beam when performing a blanking control switching beam-on and beam-off; a blanking aperture member which is arranged at the back of the blanking deflector in the direction of the optical axis and blocks the charged particle beam having been deflected to be in a beam-off state; and a magnet coil which is arranged at a center height position of the blanking deflector and deflects the charged particle beam.