发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME, POWER SUPPLY DEVICE AND HIGH-FREQUENCY AMPLIFIER
摘要 PROBLEM TO BE SOLVED: To inhibit decrease in drain current due to electrons captured by a trap formed on a surface of an insulation film and sufficiently inhibit current collapse.SOLUTION: A semiconductor device comprises: a compound semiconductor laminated structure 2 composed of a plurality of compound semiconductor layers which are stacked on a semiconductor substrate 1; and a first insulation film 6 which covers a surface of the compound semiconductor laminated structure and which is a silicon nitride film including a first region 6X containing on a surface side, a nitrogen element higher than a stoichiometric ratio.
申请公布号 JP2014138110(A) 申请公布日期 2014.07.28
申请号 JP20130006459 申请日期 2013.01.17
申请人 FUJITSU LTD 发明人 MAKIYAMA KOZO
分类号 H01L29/812;H01L21/316;H01L21/336;H01L21/338;H01L29/778;H01L29/78;H02M3/155;H02M3/28 主分类号 H01L29/812
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