发明名称 STEREOLITHOGRAPHY APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a stereolithography apparatus which suppresses deterioration in workability.SOLUTION: The stereolithography apparatus selectively irradiates a curable material set in a housing 10 with a light beam to cure the curable material, thereby shaping a three-dimensionally shaped object. The stereolithography apparatus includes a frame body 30 for supporting a member provided in the housing 10, and a front door 21 for closing a front door opening 15 penetrating the housing 10. In the stereolithography apparatus, an optical system device for light beam irradiation is mounted on an upper frame 31 of the frame body 30. That portion of the upper frame 31 which faces the front door 21 is a first recess 34 recessed inward of the housing 10 in a horizontal plane.
申请公布号 JP2014136330(A) 申请公布日期 2014.07.28
申请号 JP20130004938 申请日期 2013.01.15
申请人 CMET INC 发明人 OBA KOICHI;KOJIMA ISAO;SUZUKI KOKICHI
分类号 B29C67/00 主分类号 B29C67/00
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