RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, RESIST COMPOSITION CONTAINING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide: a resin composition through a simple method, which is suitably used for a resist material containing a carboxyl group, and has a narrow molecular weight distribution; a production method of the resin composition; a resist composition containing the resin composition; and a pattern forming method using the resist composition.SOLUTION: The resin composition contains a borane-based radical polymerization initiator (A), a vinyl monomer (B) containing a carboxyl group and a vinyl monomer (C) that does not contain a carboxyl group.