发明名称 GAS BARRIER FILM AND METHOD OF PRODUCING GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film which can suppress deterioration of gas barrier properties sufficiently even when exposed to long-time continuous vibration.SOLUTION: A gas barrier film includes a substrate 1 and one or more gas barrier layers 3 formed on at least one surface of the substrate 1, and at least one of the gas barrier layers 3 contains silicon, oxygen and nitrogen. Among distribution curves of individual constituent elements for the gas barrier layers 3 based on element distribution measurement in the depth direction by X-ray photoelectron spectroscopy, a nitrogen distribution curve C representing the relationship of the distance from the surface of a gas barrier layer 3 in the layer thickness direction of the gas barrier layer 3 and the ratio of the amount of nitrogen atoms to the total amount (100 at%) of silicon, oxygen and nitrogen atoms (nitrogen atomic ratio (at%)) has at least one extreme value.
申请公布号 JP2014136805(A) 申请公布日期 2014.07.28
申请号 JP20130004173 申请日期 2013.01.15
申请人 KONICA MINOLTA INC 发明人 TAKAMUKAI YASUHIKO
分类号 C23C16/42;B32B5/00;B32B9/00 主分类号 C23C16/42
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