发明名称 APPARATUS FOR PROVIDING THE SAMPLE GAS AND METHOD THEREOF
摘要 Provided are an apparatus and a method for supplying a sample gas. The apparatus for supplying a sample gas includes: a gas introduction unit; a first pressure gauge for measuring the pressure of the sample gas introduced through the gas introduction unit; a plurality of flow lines located between the gas introduction unit and a gas analysis unit to be opened and closed according to the pressure measured by the first pressure gauge; a plurality of control valves formed in the plurality of flow lines, respectively, to control opening/closing of the flow lines; a bypass line formed in at least one of the flow lines to discharge some of the sample gas flowing along the flow line; and a control unit for controlling the control value formed in the selected flow line by selecting one of the flow lines according to the pressure measured by the first pressure gauge.
申请公布号 KR20140093511(A) 申请公布日期 2014.07.28
申请号 KR20130006003 申请日期 2013.01.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JEONG, JONG CHEOL;JEONG, KYUNG HWAN;KIM, JONG SOO;JUN, PIL KWON
分类号 H01L21/02;G01N1/22;G01N1/34 主分类号 H01L21/02
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