发明名称 |
MEASUREMENT AND INSPECTION DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a measurement and inspection device of a scanning type electron beam system, and to provide a technology capable of achieving high-accuracy measurement and inspection depending on a scanning speed.SOLUTION: A secondary electron signal detection system in a measurement and inspection device deals with scanning control of a plurality of scanning speeds, and comprises: a detector 107 for detecting a secondary electron signal (SE) resulted from irradiation of an electron beam to a sample 110 by the scanning control; a preamplifier 30 for performing a current-voltage conversion of an output of the detector 107 to pre-amplify the converted output; an analog signal processing amplification part 51 for receiving an output of the preamplifier 30 and performing analog processing amplification of the output, and an ADC (Analog-Digital Conversion part) 52 for performing analog-to-digital conversion of an output of the analog signal processing amplification part 51, as a secondary electron signal detector 50; and an image processing part 205 for generating a measurement or inspection image on the basis of an output of the secondary electron signal detector 50. The controller 210 performs switching control of each part including a LPF (12) in the analog signal processing amplification part 51 depending on a scanning speed and the like. |
申请公布号 |
JP2014137974(A) |
申请公布日期 |
2014.07.28 |
申请号 |
JP20130007706 |
申请日期 |
2013.01.18 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
RI UEN;TAKAHASHI HIROYUKI;SUZUKI MAKOTO;KAWANO HAJIME |
分类号 |
H01J37/22;H01J37/24;H01J37/28;H01L21/66 |
主分类号 |
H01J37/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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