发明名称 SUBSTRATE PROCESSING APPARATUS AND GAS PATTERN DISPLAY METHOD
摘要 <p>PROBLEM TO BE SOLVED: To prevent danger and improve safety by further adding information required for deposition on a gas pattern screen, and grasping and confirming more information on the gas pattern screen.SOLUTION: A substrate processing apparatus includes at least gas piping for supplying gas to a processing chamber, an opening and closing valve for supplying and stopping the gas, and a flow rate controller for controlling the flow rate of the gas. The substrate processing apparatus also includes display means for displaying a gas state screen showing contents of at least the gas piping, the opening and closing valve and the flow rate controller. The display means displays the piping on the gas state screen in the color identified for each type of gas on the basis of the type of predetermined gas flowing in the gas piping in the state in which the predetermined gas is sent to the gas piping by opening and closing of the opening and closing valve, and individually displays the gas piping for each type of gas.</p>
申请公布号 JP2014138157(A) 申请公布日期 2014.07.28
申请号 JP20130007360 申请日期 2013.01.18
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 MORI SHINICHIRO
分类号 H01L21/02;G05B23/02 主分类号 H01L21/02
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