PATTERN FORMING METHOD, RESIST COMPOSITION, POLYMERIC COMPOUND AND MONOMER

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method for forming a negative pattern in which a high dissolution contrast is obtained in organic solvent development and an unexposed part is dissolved while an exposed part is not dissolved, and to provide a resist composition, a polymeric compound and a monomer for achieving the above method.SOLUTION: A negative pattern forming method is provided, in which the following resist composition is used: the resist composition comprises a polymeric compound including a repeating unit a1 expressed by formula (1). The polymeric compound decreases solubility to an organic solvent by forming a lactone ring with acid action.