| 发明名称 |
CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN |
| 摘要 |
A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1): |
| 申请公布号 |
KR20140093239(A) |
申请公布日期 |
2014.07.25 |
| 申请号 |
KR20147013258 |
申请日期 |
2012.11.14 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
ECHIGO MASATOSHI;YAMAKAWA MASAKO |
| 分类号 |
C07C39/17;C07C37/20;C07C41/16;C07C43/215;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C07C39/17 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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