发明名称 METHODS OF MAKING PATTERNED STRUCTURES OF MATERIALS, PATTERNED STRUCTURES OF MATERIALS, AND METHODS OF USING SAME
摘要 A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.
申请公布号 US2014205818(A1) 申请公布日期 2014.07.24
申请号 US201214005964 申请日期 2012.03.19
申请人 Schwartz Evan L.;Chan Wei Min;Lee Jin-Kyun;Tiwari Sandip;Ober Christopher K. 发明人 Schwartz Evan L.;Chan Wei Min;Lee Jin-Kyun;Tiwari Sandip;Ober Christopher K.
分类号 G03F7/16;H01L21/027 主分类号 G03F7/16
代理机构 代理人
主权项 1. A method of forming a layer of patterned organic polymer materials on a substrate comprising: a) forming a layer of an organic polymer material on a substrate; b) selectively exposing portions of the substrate using an orthogonal photoresist; c) selectively forming a layer of an organic polymer material on the exposed portions of the substrate; and d) optionally, repeating steps b) and c),wherein each added organic polymer material in step c) is different from the organic polymer material or polymer materials already formed on the substrate.
地址 Vadnals Heights MN US