PROCESS AND HARDWARE FOR DEPOSITION OF COMPLEX THIN-FILM ALLOYS OVER LARGE AREAS

摘要

Systems and methods for depositing complex thin-film alloys on substrates are provided. In particular, systems and methods for the deposition of thin-film Cd1-xMxTe ternary alloys on substrates using a stacked-source sublimation system are provided, where M is a metal such as Mg, Zn, Mn, and Cu.

主权项

1. A method for the deposition of a complex thin-film alloy on a substrate, the method comprising:
providing a stacked-source sublimation system comprising a first crucible defining a first heated pocket opening upward at a pocket opening; and a second crucible operatively connected to a second heating element and defining a second heated pocket opening upward into a manifold comprising a plurality of conduits, wherein the plurality of conduits connects the second heated pocket to the first heated pocket and the plurality of conduits is distributed uniformly over a bottom wall of the first heated pocket and each of the plurality of conduits extends vertically upward to connect the second heated pocket to the first heated pocket through the bottom wall; situating the substrate vertically above the pocket opening at a vertical separation distance of at least about 1 μm; sublimating a first source material at a first temperature within the first heated pocket to form a first flux; sublimating a second source material at a second temperature within the second heated pocket to form a second flux; transferring the second flux from the second heated pocket to the first heated pocket via the manifold to form a deposition mixture; and contacting the deposition mixture with the substrate to deposit the complex thin-film alloy on the substrate, wherein the substrate is maintained at a third temperature.