发明名称 LOW-STRESS TSV DESIGN USING CONDUCTIVE PARTICLES
摘要 A component can include a substrate having a first surface and a second surface remote therefrom, an opening extending in a direction between the first and second surfaces, and a conductive via extending within the opening. The substrate can have a CTE less than 10 ppm/° C. The conductive via can include a plurality of base particles each including a first region of a first metal substantially covered by a layer of a second metal different from the first metal. The base particles can be metallurgically joined together and the second metal layers of the particles can be at least partially diffused into the first regions. The conductive via can include voids interspersed between the joined base particles. The voids can occupy 10% or more of a volume of the conductive via.
申请公布号 US2014201994(A1) 申请公布日期 2014.07.24
申请号 US201414219398 申请日期 2014.03.19
申请人 Tessera, Inc. 发明人 Woychik Charles G.;Desai Kishor;Mohammed Ilyas;Caskey Terrence
分类号 H05K3/00 主分类号 H05K3/00
代理机构 代理人
主权项 1. A method of fabricating a component, comprising: providing a substrate having a first surface and a second surface remote therefrom, the substrate having a CTE less than 10 ppm/° C., the substrate having an opening extending from the first surface towards the second surface; depositing a plurality of base particles into the opening, each base particle including a first metal region and a second metal layer covering the first metal region, the second metal layer having a melting point below 400° C., the first metal region having a melting point of 500° C. or more; and heating the base particles so that each second metal layer fuses the base particles to one another to form a continuous conductive via extending within the opening, the conductive via including voids interspersed between the joined base particles, the voids occupying 10% or more of a volume of the conductive via.
地址 San Jose CA US