发明名称 METHOD OF MANUFACTURING VAPOR DEPOSITION MASK, AND METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a vapor deposition mask capable of satisfying both high definition and weight saving even when the size is increased, and to provide a method of manufacturing an organic semiconductor element capable of manufacturing a high-definition organic semiconductor element.SOLUTION: There is provided a method of manufacturing a vapor deposition mask configured by laminating a metal mask provided with a slit, and a resin mask provided with an opening corresponding to a pattern produced by vapor deposition at a position overlapped with the slit. The method includes: preparing a resin layer with a metal mask provided with a metal mask to which the slit is formed, on one surface of the resin layer; and emitting laser light from the metal mask side to form an opening corresponding to the pattern produced to the resin layer by vapor deposition. At the step of forming the opening, the laser light is emitted from the metal mask side in a state that liquid is contacted with the another surface of the resin layer in the resin layer with the metal mask.
申请公布号 JP2014135246(A) 申请公布日期 2014.07.24
申请号 JP20130003926 申请日期 2013.01.11
申请人 DAINIPPON PRINTING CO LTD 发明人 TAKEDA TOSHIHIKO;OBATA KATSUYA
分类号 H05B33/10;C23C14/04;H01L51/50 主分类号 H05B33/10
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