Thermal Monitor For An Extreme Ultraviolet Light Source

摘要

A first temperature distribution that represents a temperature of an element adjacent to and distinct from a first optical element that is positioned to receive an amplified light beam is accessed. The accessed first temperature distribution is analyzed to determine a temperature metric associated with the element, the determined temperature metric is compared to a baseline temperature metric, and an adjustment to position of the amplified light beam relative to the first optical element is determined based on the comparison.

主权项

1. A method for adjusting a position of an amplified light beam relative to a first optical element in an extreme ultraviolet (EUV) light source, the method comprising:
accessing a first temperature distribution that represents a temperature of an element adjacent to and distinct from the first optical element, the first optical element being positioned to receive the amplified light beam; analyzing the accessed first temperature distribution to determine a temperature metric associated with the element adjacent to and distinct from the first optical element; comparing the determined temperature metric to a baseline temperature metric; and determining an adjustment to a position of the amplified light beam relative to the first optical element based on the comparison.