SUBSTRATE-PROCESSING DEVICE

摘要

According to one embodiment of the present invention, a substrate-processing device comprises: a processing chamber where a substrate is processed; a preparation chamber linked to the processing chamber and having a through pathway for inserting and taking out the substrate; a screening plate for compartmentalising the inside of the preparation chamber into a holder area and a forwarding area; a substrate holder for mounting one or more of the substrates, and able to switch between a mounting location located inside the holder area and a processing location located inside the processing chamber; a substrate forwarding unit for forwarding the substrate holder to the mounting location and the processing location, and having a forwarding arm which is connected to the substrate holder and having a drive unit which is provided inside the forwarding area and drives the forwarding arm; a gas-supply port for supplying an inert gas to the preparation chamber; and a bottom-part evacuation port for evacuating the inside of the preparation chamber, being connected to the forwarding area and provided on an upper part of the gas-supply port. The exhaust opening is disposed closer to the lower surface than to the upper surface of the preparation chamber.