METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING ARTICLE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method advantageous for suppressing peeling of a resist pattern when forming a pattern by 1D layout.SOLUTION: A pattern forming method for forming a pattern in a layer 3 on a substrate includes: a first step of forming a line-and-space pattern on the layer 3; a second step of filling a space portion with a resist by applying the resist to the line-and-space pattern; a third step of exposing the pattern to the resist and forming a resist pattern 8 in the space portion by developing the exposed resist; and a fourth step of forming a pattern on the layer using a pattern which is a combination of a line portion 5' of the line-and-space pattern and the resist pattern 8 as a mask.