发明名称 |
ELECTROCHROMIC LITHIUM NICKEL GROUP 5 MIXED METAL OXIDES |
摘要 |
Multi-layer electrochromic structures comprising an anodic electrochromic layer comprising a lithium nickel oxide composition on a first substrate, the anodic electrochromic layer comprising lithium, nickel and a Group 5 metal selected from niobium, tantalum and a combination thereof, wherein (i) the atomic ratio of lithium to the combined amount of nickel, niobium and tantalum in the anodic electrochromic layer is at least 0.4:1, respectively, (ii) the atomic ratio of the combined amount of niobium and tantalum to the combined amount of nickel, niobium and tantalum in the anodic electrochromic layer is at least about 0.025:1, respectively, and (iii) the anodic electrochromic layer exhibits an interplanar distance (d-spacing) of at least 2.5 Å as measured by X-ray diffraction (XRD), comprises at least 0.05 wt. % carbon, and/or has a coloration efficiency absolute value of at least 19 cm2/C. |
申请公布号 |
US2014204447(A1) |
申请公布日期 |
2014.07.24 |
申请号 |
US201414160394 |
申请日期 |
2014.01.21 |
申请人 |
Kinestral Technologies, Inc. |
发明人 |
CHOI Hye Jin;BAILEY Mark;BASS John David;von KUGELGEN Stephen Winthrop;LACHMAN Eric;TURNER Howard W. |
分类号 |
G02F1/153 |
主分类号 |
G02F1/153 |
代理机构 |
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代理人 |
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主权项 |
1. A multi-layer electrochromic structure comprising a first substrate and an anodic electrochromic layer comprising a lithium nickel oxide composition on the first substrate, the anodic electrochromic layer containing lithium, nickel, and at least one Group 5 metal selected from the group consisting of niobium and tantalum, wherein
(i) the atomic ratio of lithium to the combined amount of nickel and such Group 5 metal(s) in the anodic electrochromic layer is at least 0.4:1, respectively, (ii) the atomic ratio of the amount of such Group 5 metal(s) to the combined amount of nickel and such Group 5 metal(s) in the anodic electrochromic layer is at least about 0.025:1, respectively, and (iii) the anodic electrochromic layer exhibits an interplanar distance (d-spacing) of at least 2.5 Å as measured by X-ray diffraction (XRD). |
地址 |
South San Francisco CA US |