发明名称 |
PRECURSOR DISTRIBUTION FEATURES FOR IMPROVED DEPOSITION UNIFORMITY |
摘要 |
Showerheads are described including a first plurality of apertures configured to receive a first fluid that may be distributed to a processing region of a semiconductor substrate processing chamber. The first plurality of apertures may include a first set of apertures and a second set of apertures, and the first set of apertures may have an aperture diameter that is greater than the aperture diameter of the second set of apertures. The showerheads may also have a second plurality of apertures configured to receive a second fluid to be distributed to the processing region of the substrate processing chamber. The showerhead may be configured to maintain the first and second fluids fluidly isolated prior to their distribution to the processing region. |
申请公布号 |
KR20140092892(A) |
申请公布日期 |
2014.07.24 |
申请号 |
KR20147015590 |
申请日期 |
2012.10.24 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
PARK, SOO NAM;HINCKLEY KIMBERLY;LIANG QIWEI;YANG JANG GYOO |
分类号 |
H01L21/205;H01L21/02;H01L21/67 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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