| 摘要 |
A photomask includes a transparent substrate and a light-shielding section provided on the transparent substrate. The light-shielding section has a translucent mask pattern opening, and in the mask pattern opening, there are provided a plurality of translucent areas that transmit light to peripheries of areas corresponding to a desired pattern, in at least three different phases with respect to exposure light. In order that exposure light having passed through the mask pattern opening should form a projected image in a desired pattern on an exposed body positioned at a predetermined distance, the translucent areas are configured as follows: a phase plane of the exposure light that has passed through a translucent area far from the areas corresponding to the desired pattern, among the translucent areas, progresses with respect to the exposed body, as compared with a phase plane of exposure light that has passed through a translucent area close to the areas corresponding to the desired pattern. |
