发明名称 |
CHARGED PARTICLE BEAM DEVICE AND ITS ABERRATION COMPENSATION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a charge particle beam device capable of reducing adjustment frequencies of the aberration measurement and an aberration corrector and adjustment time per one adjustment while maintaining resolution and processing accuracy.SOLUTION: On a charged particle beam device equipped with an aberration corrector, a control part is mounted which discriminates between aberration caused by the aberration corrector and aberration caused by an optical system other than the aberration corrector and which controls correction operation of the optical system and/or the aberration corrector by causes of the aberration. |
申请公布号 |
JP2014135227(A) |
申请公布日期 |
2014.07.24 |
申请号 |
JP20130003425 |
申请日期 |
2013.01.11 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
URANO KOTOKO;NAKANO TOMONORI |
分类号 |
H01J37/153;H01J37/244;H01J37/28 |
主分类号 |
H01J37/153 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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