发明名称 CHARGED PARTICLE BEAM DEVICE AND ITS ABERRATION COMPENSATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a charge particle beam device capable of reducing adjustment frequencies of the aberration measurement and an aberration corrector and adjustment time per one adjustment while maintaining resolution and processing accuracy.SOLUTION: On a charged particle beam device equipped with an aberration corrector, a control part is mounted which discriminates between aberration caused by the aberration corrector and aberration caused by an optical system other than the aberration corrector and which controls correction operation of the optical system and/or the aberration corrector by causes of the aberration.
申请公布号 JP2014135227(A) 申请公布日期 2014.07.24
申请号 JP20130003425 申请日期 2013.01.11
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 URANO KOTOKO;NAKANO TOMONORI
分类号 H01J37/153;H01J37/244;H01J37/28 主分类号 H01J37/153
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