发明名称 INTERCONNECTION DESIGNS AND MATERIALS HAVING IMPROVED STRENGTH AND FATIGUE LIFE
摘要 Methods and designs for increasing interconnect areas for interconnect bumps are disclosed. An interconnect bump may be formed on a substrate such that the interconnect bump extends beyond a contact pad onto a substrate. An interconnect bump may be formed on a larger contact pad, the bump having a large diameter.
申请公布号 US2014203430(A1) 申请公布日期 2014.07.24
申请号 US201414171458 申请日期 2014.02.03
申请人 Micron Technology, Inc. 发明人 Sterrett Terry Lee;Harries Richard J.
分类号 H01L23/00 主分类号 H01L23/00
代理机构 代理人
主权项 1. A system comprising: an integrated circuit die; an integrated circuit package; a first level interconnection between the die and the package; a system board; a second level interconnection between the package and the system board; and interconnect bumps in at least one of the interconnections, the interconnect bumps including a diameter greater than a height of interconnect bumps.
地址 Boise ID US