| 摘要 |
Provided is a polishing solution for metal intended for polishing at least part of a metal, which includes: (A) an amino acid, (B) a 1-hydroxybenzotriazole, (C) a compound with a benzotriazole skeleton (except 1-hydroxybenzotriazole), (D) a polymer having at least one structural unit of among: structural unit derived from (meta)acrylic acid, structural unit derived from (meta)acrylate, structural unit derived from (meta)acrylamide, and structural unit derived from amino(meta)acrylamide. Weight average molecular mass of compound (D) is 10000 or more, total mass ratio of total content of compound (B) and compound (C) to the total content of (D) is 0.15 to 3.00 and pH is 3.0 to 6.0. |
