摘要 |
The present invention relates to a barrel susceptor capable of making an entire wafer placed on a reaction surface of the barrel susceptor, regardless of number, to have a same resistivity value. The barrel susceptor includes a main body including multiple reaction surfaces, while having a pyramid shape of an N-polygon transverse cross section; at least one pocket portion respectively prepared on the reaction surfaces along the length direction on which the wafer is arranged; and multiple partition portions prepared on border edges between reaction surfaces along the length direction, while stretched at a predetermined height from the border edges. |