发明名称 NONVOLATILE MEMORY DEVICE
摘要 <p>A nonvolatile memory device is provided. The nonvolatile memory device includes a substrate; an active region and a device isolation region which are defined on the substrate; and multiple word lines which interest with the active region. Each word line includes a tunneling insulating layer, a charge storage layer, and a blocking insulating layer which are successively stacked. The device isolation region includes a trench and a field insulating layer which fills the trench. The first surface index of the bottom of the trench has a first interface trap. The second surface index of the bottom of the trench has a second interface trap which is same as or less than the first interface trap.</p>
申请公布号 KR20140091960(A) 申请公布日期 2014.07.23
申请号 KR20130004042 申请日期 2013.01.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, JOON YOUNG;LEE, SANG EUN;CHOI, SAM JONG;KIM, JIN HO
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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