In-situ dry clean chamber for front end of line fabrication
摘要
<p>A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the chamber (100) comprises a chamber body (112) and a support assembly (300) at least partially disposed within the chamber body and adapted to support a substrate thereon. The support assembly includes one or more fluid channels (360) at least partially formed therein and capable of cooling the substrate. The chamber further comprises a lid assembly (200) disposed on an upper surface of the chamber body. The lid assembly includes a first electrode (240) and a second electrode (220) which define a plasma cavity therebetween, wherein the second electrode is adapted to connectively heat the substrate.</p>
申请公布号
EP1568797(B1)
申请公布日期
2014.07.23
申请号
EP20050251143
申请日期
2005.02.25
申请人
APPLIED MATERIALS, INC.
发明人
KAO, CHIEN-TEH;CHOU, JING-PEI (CONNIE);LAI, CHIUKIN (STEVEN);UMOTOY, SAL;HUSTON, JOEL M.;TRINH, SON;CHANG, MEI;YUAN, XIAOXIONG (JOHN);CHANG, YU;LU, XINLIANG;WANG, WIE W.;PHAN, SEE-ENG