| 摘要 |
A mixture of a polymer containing free nitrile groups, a polybasic acid, and a strong acid catalyst is subjected to heat, with or without pressure, whereby cross-linking by the formation of diacylamino groups occurs. Polymers containing free nitrile groups are those of acrylonitrile, methacrylonitrile, crotononitrile, cinnamonitrile, chloracrylonitrile, maleonitrile, fumaronitrile, and their copolymers with butadiene, vinyl formate, acetate, propionate, butyrate, and stearate, the esters of allyl, methallyl, ethallyl, chlorallyl, crotonyl, and cinnamyl alcohols, and but-1-ene-3-ol and pent-1-ene-3-ol, with formic, acetic, lactic, butyric, oleic, glycollic, salicylic, benzoic, and phthalic acids, methyl, ethyl, isopropyl, and butyl vinyl ketones, allyl substituted aldehydes and ketones, methyl, ethyl, isopropyl, butyl, phenyl, tolyl, and naphthyl vinyl and propenyl ethers, allyl ethers, isobutylene, styrene, alphamethyl styrene, N-vinyl urethanes, carbazole, pyrrole, piperidine, and pyrrolidone, and allyl acetals and ketals; also employed may be polymers obtained by condensing a polycarboxylic acid with a polyhydric alcohol containing a free nitrile group. Polybasic acids specified are adipic, pimelic, suberic, azelaic, sebacic, tricarballylic, citric, and aconitic acids, and polymers and copolymers of unsaturated carboxylic acids such as acrylic, maleic, and fumaric acids, e.g. a copolymer of acrylic acid and styrene. Strong acid catalysts specified are phosphoric, paratoluene sulphonic, camphoryl sulphonic, and trichloracetic acids, and compounds which give rise to acid under reaction conditions, e.g. butadiene sulphone. The process is preferably carried out at a temperature of 100 DEG to 200 DEG C., and may be used in the manufacture of tiles. |
