发明名称 Self-aligned wafer bonding
摘要 A wafer article includes a substrate, two or more hydrophilic areas disposed on the substrate, hydrophobic areas surrounding the hydrophilic areas, and a eutectic bonding material disposed on the substrate. A wafer apparatus including two wafers having complimentary hydrophilic regions and eutectic bonding material is disclosed and a method of forming a bonded wafer articles is disclosed.
申请公布号 US8784975(B2) 申请公布日期 2014.07.22
申请号 US201313913817 申请日期 2013.06.10
申请人 Seagate Technology LLC 发明人 Zheng Jun;Setiadi Dadi
分类号 B32B3/02 主分类号 B32B3/02
代理机构 Mueting, Raasch & Gebhardt PA 代理人 Mueting, Raasch & Gebhardt PA
主权项 1. A wafer apparatus comprising: a first wafer comprising a first substrate and two or more first hydrophilic areas disposed on the first substrate, first hydrophobic areas surrounding the first hydrophilic areas, and a first eutectic bonding material disposed on the first substrate; a second wafer comprising a second substrate and two or more second hydrophilic areas disposed on the second substrate, second hydrophobic areas surrounding the second hydrophilic areas, and a second eutectic bonding material disposed on the second substrate and bonded with the first eutectic bonding material, the first hydrophilic areas aligned with and facing the second hydrophilic areas.
地址 Cupertino CA US