Shear-layer chuck for lithographic apparatus

摘要

A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

主权项

1. A system, comprising:
a chuck having a first surface and a second surface, the second surface being located opposite the first surface, and the first surface supports an object; an array of elongated elements having first and second respective ends and having longitudinal axes normal to the second surface of the chuck, such that the first ends contact the second surface of the chuck and the second ends contact a stage; and an interface membrane layer disposed between the chuck and the stage, such that the array of elongated elements passes through the interface layer, wherein the array of elongated elements are configured such that a transfer of stress between the stage and the chuck is rendered substantially uniform, resulting in minimization of slippage of the object relative to the first surface of the chuck during a deformation of the chuck due to the stress.