| 主权项 |
1. An apparatus for illuminating a marking, which is applied on a planar transparent reticle in the form of a diffraction structure,
wherein the reticle has a first face and a second face opposed to the first face, wherein illuminating beams are injected into the reticle via a side edge surface of the reticle such that they are emitted after diffraction at the marking perpendicular to a plane of the reticle, wherein a first mirror is a concavely curved mirror having two focal points and is attached to the side edge surface such that a first light source is arranged in a region of the first focal point and the marking is arranged in a region of the second focal point, wherein a second mirror is a concavely curved mirror having two focal points and is attached to the side edge surface such that a second light source with a second emission wavelength, different from a first emission wavelength of the first light source, is arranged in a region of the first focal point of the second mirror, and the marking is arranged in a region of the second focal point of the second mirror, wherein the first emission wavelength is reflected on the first face at a first distance from an optical axis of the reticle, wherein the second emission wavelength is reflected on the first face at a second distance from the optical axis that differs from the first distance, and wherein an angle of incidence of light from the first light source on the marking is different from an angle of incidence of light from the second light source on the marking such that light from the first light source has an angle of emission from the marking that is the same as an angle of emission from the marking of light from the second light source. |
