| 发明名称 | Lithographic apparatus and device manufacturing method | ||
| 摘要 | An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased. | ||
| 申请公布号 | US8786823(B2) | 申请公布日期 | 2014.07.22 |
| 申请号 | US201012960947 | 申请日期 | 2010.12.06 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Leenders Martinus Hendrikus Antonius;Kemper Nicolaas Rudolf;Ottens Joost Jeroen |
| 分类号 | G03B27/42 | 主分类号 | G03B27/42 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A lithographic apparatus, comprising: a projection system; a table configured to hold a substrate to be imaged by the projection system; and a liquid supply system configured to provide a space between the projection system and the substrate with liquid, at least a part of the liquid supply system being moveable relative to and independent of the projection system and the substrate; and a controller configured to control the amount of supply of the liquid based on direction of movement of the at least part of the liquid supply system. | ||
| 地址 | Veldhoven NL | ||