发明名称 Semiconductor device and method of controlling semiconductor device
摘要 Provided is a semiconductor device including: a memory cell having a variable resistance device; and a control unit that controls a voltage applied to the memory cell, wherein the variable resistance device includes a lower electrode contains a first metal material, an upper electrode containing a second metal material, and an insulating film containing oxygen, the first metal material has a normalized oxide formation energy higher than that of the second metal material, and the control unit applies a positive voltage to the upper electrode at the time of an operation of increasing a resistance value of the insulating film and an operation of decreasing the resistance value thereof, and applies a positive voltage to the lower electrode at the time of an operation of reading out the resistance value of the insulating film.
申请公布号 US8787067(B2) 申请公布日期 2014.07.22
申请号 US201213359449 申请日期 2012.01.26
申请人 Renesas Electronics Corporation 发明人 Saitoh Motofumi;Terai Masayuki
分类号 G11C11/00 主分类号 G11C11/00
代理机构 McGinn IP Law Group, PLLC 代理人 McGinn IP Law Group, PLLC
主权项 1. A semiconductor device comprising: a memory cell having a variable resistance device; and a control unit that controls a voltage applied to the memory cell, wherein the variable resistance device includes a first electrode containing a first metal material, a second electrode containing a second metal material, and an insulating film, provided between the first electrode and the second electrode, that contains a third metal material and oxygen, the first metal material has a normalized oxide formation energy higher than that of the second metal material, and the control unit applies a positive voltage to the second electrode at the time of an operation of increasing a resistance value of the insulating film and an operation of decreasing the resistance value thereof, and applies a positive voltage to the first electrode at the time of an operation of reading out the resistance value of the insulating film.
地址 Kawasaki-shi, Kanagawa JP