| 摘要 |
FIELD: physics.SUBSTANCE: method of making microcontacts of photodetector arrays according to the invention includes forming, on a plate with LSI arrays or photodiode arrays, a metal interlayer (e.g. Cr+Ni) with a circular shape, protecting the chip with a photoresist film with circular windows at contact points, depositing an indium layer with thickness which corresponds to the height of the microcontacts, forming a circular photoresist mask on the indium layer, then forming microcontacts by etching with inert gas ions until indium is completely sprayed in the spaces between contacts, removing the photoresist mask remains at the top of microcontacts and the lower protective film in organic solvents or by etching in oxygen plasma.EFFECT: forming microcontacts with height of 4-12 mcm.6 dwg |
