| 摘要 |
<p>The reactor comprises an enclosure (ENC) provided with a pumping unit (PV), a substrate holder and a heating unit (IR). The substrate holder has an opening facing the heating unit so that the substrate holder is not in contact with a rear face of a substrate. The heating unit is arranged in the enclosure compared to the opening. The reactor further comprises a protection plate (PP) interposed between the opening and the heating unit. The plate is transparent with the radiation of the heating unit. The reactor comprises an enclosure (ENC) provided with a pumping unit (PV), a substrate holder and a heating unit (IR). The substrate holder has an opening facing the heating unit so that the substrate holder is not in contact with a rear face of a substrate. The heating unit is arranged in the enclosure compared to the opening. The reactor further comprises a protection plate (PP) interposed between the opening and the heating unit. The plate is transparent with the radiation of the heating unit. The heating unit is arranged outside the enclosure and behind a port-hole in front of the opening. The substrate holder takes a shape of a frame provided with an internal edge designed to retain the substrata and takes a shape of two plates (T1, T2) between which the opening is formed and the substrate rests on the plates.</p> |
