| 摘要 |
Disclosed is a process apparatus having a multi-exposure system. The multi-exposure system includes an arrangement device and an exposure part. The arrangement device includes an x-axis arrangement device arranging a substrate mounted on a shuttle device fixture plate, having a finger on which a plurality of substrates and a driving device for mounting the substrates placed on the finger into a fixing plate, in an x-axis direction by approaching from both sides of the substrate in an x-axis direction and a y-axis arrangement device arranging the substrate in a y-axis direction by approaching from both sides of the substrate in a y-axis direction. |
