FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of shortening a period until the gas injection state is stabilized after opening a shutter, and to provide a film deposition method capable of shortening the period until the gas injection state is stabilized after opening the shutter.SOLUTION: A film deposition apparatus 10 includes a vapor deposition head 12 and a shutter 14. The vapor deposition head has an injection port for injecting gas containing gas molecules of a vapor deposition material. The shutter can be arranged on a position where gas from the injection port of the vapor deposition head can be blocked. The shutter has a cooling part for cooling the shutter.