| 发明名称 |
METHOD AND SYSTEM FOR ESTABLISHING PARAMETRIC MODEL |
| 摘要 |
A method for establishing a parametric model of a semiconductor process is provided. A first intermediate result is generated according to layout data and a non-parametric model of the semiconductor process. A first response is obtained according to the first intermediate result. A specific mathematical function is selected from a plurality of mathematical functions, and the parametric model is obtained according to the specific mathematical function. A second intermediate result is generated according to the layout data and the parametric model. A second response is obtained according to the second intermediate result. It is determined whether the parametric model is an optimal model according to the first and second responses. |
| 申请公布号 |
US2014200866(A1) |
申请公布日期 |
2014.07.17 |
| 申请号 |
US201313742881 |
申请日期 |
2013.01.16 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD ;NATIONAL TAIWAN UNIVERSITY |
发明人 |
TSAI Kuen-Yu;LIU Chun-Hung |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for establishing a parametric model of a semiconductor process, comprising:
generating a first intermediate result according to layout data and a non-parametric model of the semiconductor process; obtaining a first response according to the first intermediate result; selecting a specific mathematical function from a plurality of mathematical functions, and obtaining the parametric model according to the specific mathematical function; generating a second intermediate result according to the layout data and the parametric model; obtaining a second response according to the second intermediate result; and determining whether the parametric model is an optimal model according to the first and second responses. |
| 地址 |
Hsinchu TW |
