| 发明名称 |
CRYOGENIC LIQUID CLEANING APPARATUS AND METHODS |
| 摘要 |
A cryogenic cleaning apparatus is disclosed. The cryogenic cleaning apparatus has a source of cryogen, a nozzle coupled to the source of cryogen, the nozzle including a main passage adapted to receive the cryogen, one or more auxiliary gas inlets adapted to supply an auxiliary gas to mix with the cryogen either within the nozzle or at a nozzle exit of the nozzle to produce cryogen droplets, and a heated holder adapted to receive a substrate to be cleaned. Cryogenic cleaning methods adapted to clean substrates are provided, as are numerous other aspects. |
| 申请公布号 |
US2014196749(A1) |
申请公布日期 |
2014.07.17 |
| 申请号 |
US201414146382 |
申请日期 |
2014.01.02 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
Tang Jianshe;Huey Sidney P.;Karuppiah Lakshmanan |
| 分类号 |
H01L21/67;H01L21/02 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A cryogenic cleaning apparatus, comprising:
a source of cryogen adapted to deliver a cryogen; a nozzle coupled to the source of cryogen, the nozzle including a main passage adapted to receive the cryogen and one or more auxiliary gas inlets adapted to supply an auxiliary gas from an auxiliary gas source and to mix with the cryogen either within the nozzle or at a nozzle exit of the nozzle; and a heated holder adapted to receive a substrate to be cleaned. |
| 地址 |
Santa Clara CA US |
