| 发明名称 |
MODIFIED POLYSILAZANE FILM AND METHOD FOR PRODUCING GAS BARRIER FILM |
| 摘要 |
Provided are a modified polysilazane film that is preferable as an intermediate material for forming a predetermined gas barrier film, and a method for producing a gas barrier film having excellent gas barrier properties using such modified polysilazane film as an intermediate material.;A modified polysilazane film comprising a substrate and a modified polysilazane layer formed thereon, and a method for producing a gas barrier film obtained through such intermediate material, wherein the modified polysilazane layer has a thickness of a value in the range of 10 to 500 nm, and the modified polysilazane layer has a refractive index of a value in the range of 1.48 to 1.63. |
| 申请公布号 |
US2014199544(A1) |
申请公布日期 |
2014.07.17 |
| 申请号 |
US201214126129 |
申请日期 |
2012.07.12 |
| 申请人 |
Naganawa Satoshi;Suzuki Yuta |
发明人 |
Naganawa Satoshi;Suzuki Yuta |
| 分类号 |
C09D183/16;C09D1/00;B05D5/00 |
主分类号 |
C09D183/16 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A modified polysilazane film comprising a substrate and a modified polysilazane layer formed thereon, wherein the modified polysilazane layer has a thickness of a value in the range of 10 to 500 nm, and the modified polysilazane layer has a refractive index of a value in the range of 1.48 to 1.63. |
| 地址 |
Tokyo JP |
