| 发明名称 |
Deposition Substrate Temperature and Monitoring |
| 摘要 |
An apparatus for depositing a coating on one or more parts (21) has: a chamber (22); a part holder (64) for carrying the part(s); a bias voltage source (94) coupled to the part(s) to apply a bias voltage to the part(s); a source (34) of the coating material; a plurality of temperature sensors (76); and a plurality of leads (90) passing outputs of the temperature sensors out from the chamber. A temperature monitoring system (150) has a temperature data processor (300). At least one fiber optic link (223) couples the temperature data processor to the temperature sensors so as to electrically isolate the temperature data processor from the bias voltage. |
| 申请公布号 |
US2014199490(A1) |
申请公布日期 |
2014.07.17 |
| 申请号 |
US201414215986 |
申请日期 |
2014.03.17 |
| 申请人 |
United Technologies Corporation |
发明人 |
Mullin Richard S.;Kuzmichev Anatoly;Belousov Igor V.;Kononenko Yuriy G.;Pankov Oleg G.;Ryzhikov Dmitriy |
| 分类号 |
C23C14/54 |
主分类号 |
C23C14/54 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for depositing a coating on one or more part(s) (21), the apparatus comprising:
a chamber (22); a part holder (64) for carrying the part(s) (21); a bias voltage source (94) coupled to the part(s) to apply a bias voltage to the part(s); a source (34) of the coating material; a plurality of temperature sensors (76); a plurality of leads (90) passing outputs of the temperature sensors out from the chamber; a temperature monitoring system (150) comprising a temperature data processor (300); and at least one fiber optic link (223) coupling the temperature data processor to the temperature sensors so as to electrically isolate the temperature data processor from the bias voltage. |
| 地址 |
Hartford CT US |
