| 摘要 |
<p>PROBLEM TO BE SOLVED: To decrease the set-up time of an ion beam, in high-energy ion injection processing having an ion source, an extraction assembly, and an electrode assembly.SOLUTION: An ion beam 106 having first energy may be generated by using an ion source and an extraction assembly. First voltage may be applied between electrode assemblies 112. The ion beam may enter the electrode assemblies with the first energy, go out from the electrode assemblies with second energy, and inject the ion in a target with the second energy. Second voltage may be applied between the electrode assemblies. The ion beam may enter the electrode assemblies with the first energy, go out from the electrode assemblies with third energy, and inject an ion in a target with the third energy. The third energy may differ from the second energy.</p> |
