发明名称 VARIABLE-RESISTANCE MATERIAL MEMORIES AND METHODS
摘要 Variable-resistance memory material cells are contacted by vertical bottom spacer electrodes. Variable-resistance material memory spacer cells are contacted along the edge by electrodes. Processes include the formation of the bottom spacer electrodes as well as the variable-resistance material memory spacer cells. Devices include the variable-resistance memory cells.
申请公布号 US2014199821(A1) 申请公布日期 2014.07.17
申请号 US201414216068 申请日期 2014.03.17
申请人 Micron Technology, Inc. 发明人 Liu Jun
分类号 H01L45/00 主分类号 H01L45/00
代理机构 代理人
主权项 1. A method of forming a memory device, comprising: forming a dielectric on a semiconductive substrate; forming a first electrode against the dielectric; forming a variable resistance material coupled to the first electrode, wherein a first minor-axis surface of the first electrode forms an interface with the variable resistance material; and forming a second electrode coupled to the variable resistance material.
地址 Boise ID US