发明名称 |
VARIABLE-RESISTANCE MATERIAL MEMORIES AND METHODS |
摘要 |
Variable-resistance memory material cells are contacted by vertical bottom spacer electrodes. Variable-resistance material memory spacer cells are contacted along the edge by electrodes. Processes include the formation of the bottom spacer electrodes as well as the variable-resistance material memory spacer cells. Devices include the variable-resistance memory cells. |
申请公布号 |
US2014199821(A1) |
申请公布日期 |
2014.07.17 |
申请号 |
US201414216068 |
申请日期 |
2014.03.17 |
申请人 |
Micron Technology, Inc. |
发明人 |
Liu Jun |
分类号 |
H01L45/00 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method of forming a memory device, comprising:
forming a dielectric on a semiconductive substrate; forming a first electrode against the dielectric; forming a variable resistance material coupled to the first electrode, wherein a first minor-axis surface of the first electrode forms an interface with the variable resistance material; and forming a second electrode coupled to the variable resistance material. |
地址 |
Boise ID US |