发明名称 METHOD OF DEPOSITING A FILM AND FILM DEPOSITION APPARATUS
摘要 A method of depositing a film including carrying substrates in plural substrate mounting portions formed on a turntable in a peripheral direction by intermittently rotating the turntable, arranging the plural substrate mounting portions in a carry-in and carry-out area, and sequentially mounting the substrates on the substrate mounting portions, depositing a thin film on a surface of each substrate to laminate a reaction product of reaction gases, which mutually react, by repeating a cycle of rotating the turntable to revolve the substrates and alternately supplying the reaction gases onto surfaces of the substrates, reformulating the thin film by heating each substrate sequentially arranged in a heating area adjacent to the carry-in and carry-out area while intermittently rotating the turntable, and carrying each substrate out after sequentially arranging each substrate, the thin film on which is reformulated, in the carry-in and carry-out area by intermittently rotating the turntable.
申请公布号 US2014199856(A1) 申请公布日期 2014.07.17
申请号 US201414150929 申请日期 2014.01.09
申请人 Tokyo Electron Limited 发明人 KATO Hitoshi;Nakatsubo Toshiyuki;Miura Shigehiro
分类号 H01L21/687;H01L21/02 主分类号 H01L21/687
代理机构 代理人
主权项 1. A method of depositing a film comprising: carrying substrates in a plurality of substrate mounting portions formed on a turntable in a peripheral direction by intermittently rotating the turntable, arranging the plurality of substrate mounting portions in a carry-in and carry-out area, and sequentially mounting the substrates on the substrate mounting portions; depositing a thin film on a surface of each substrate to laminate a reaction product of reaction gases, which mutually react, by repeating a cycle of rotating the turntable to orbitally revolve the substrates and alternately supplying the reaction gases onto surfaces of the substrates; reformulating the thin film by heating each substrate sequentially arranged in a heating area adjacent to the carry-in and carry-out area while intermittently rotating the turntable; and carrying each substrate out after sequentially arranging each substrate, the thin film on which is reformulated in the reformulating the thin film, in the carry-in and carry-out area by intermittently rotating the turntable.
地址 Tokyo JP