| 发明名称 |
IMPRINT LITHOGRAPHY |
| 摘要 |
A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head; or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets. |
| 申请公布号 |
US2014199485(A1) |
申请公布日期 |
2014.07.17 |
| 申请号 |
US201414222013 |
申请日期 |
2014.03.21 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SCHRAM Ivar;Dijksman Johan Frederik;Wuister Sander Frederik;Kruijt-Stegeman Yvonne Wendela;Lammers Jeroen Herman |
| 分类号 |
B05D5/00 |
主分类号 |
B05D5/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography, the method comprising:
moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate; and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets. |
| 地址 |
Veldhoven NL |
