发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING RESIN PATTERN, CURED PRODUCT, AND OPTICAL MEMBER
摘要 The purpose of the present invention is to provide a positive photosensitive resin composition with which dissolution of unexposed portions during development can be prevented. The positive photosensitive resin composition of the present invention is characterized in comprising (component A) inorganic particles, (component B)a dispersant having acid groups, (component C) a solvent, (component D) a polymer comprising (a-1) structural units having groups that are eliminated in the presence of acid and/or heat and (a-2) structural units having crosslinkable groups, and (component E)a photoacid generator, wherein the acid value of component D is 50 mg KOH/g or less.
申请公布号 KR20140090626(A) 申请公布日期 2014.07.17
申请号 KR20147012704 申请日期 2012.10.12
申请人 FUJIFILM CORPORATION 发明人 FUJIMORI JUNICHI;SHIMONO KATSUHIRO;KUBOTA MAKOTO;SUZUKI SHIGEKAZU
分类号 G03F7/039;C08F220/26;G03F7/004;H01L21/027 主分类号 G03F7/039
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