发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING RESIN PATTERN, CURED PRODUCT, AND OPTICAL MEMBER |
摘要 |
The purpose of the present invention is to provide a positive photosensitive resin composition with which dissolution of unexposed portions during development can be prevented. The positive photosensitive resin composition of the present invention is characterized in comprising (component A) inorganic particles, (component B)a dispersant having acid groups, (component C) a solvent, (component D) a polymer comprising (a-1) structural units having groups that are eliminated in the presence of acid and/or heat and (a-2) structural units having crosslinkable groups, and (component E)a photoacid generator, wherein the acid value of component D is 50 mg KOH/g or less. |
申请公布号 |
KR20140090626(A) |
申请公布日期 |
2014.07.17 |
申请号 |
KR20147012704 |
申请日期 |
2012.10.12 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
FUJIMORI JUNICHI;SHIMONO KATSUHIRO;KUBOTA MAKOTO;SUZUKI SHIGEKAZU |
分类号 |
G03F7/039;C08F220/26;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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