Method of Measuring a Characteristic

摘要

During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.

主权项

1. A method comprising:
exposing a repeating pattern in a layer of resist on a substrate; transferring the pattern into the substrate; modifying an element of the pattern; projecting a beam of radiation onto the pattern; and measuring the intensity distribution of the reflected radiation beam.