发明名称 DRESSING APPARATUS
摘要 The present invention relates to a dresser device capable of intensively dressing a specific region of a polishing pad. In the dresser device for dressing the polishing pad while rotating between upper and lower surface plates, the present invention provides the dresser device comprising a ring-shaped main body in which sawteeth engaged with the upper and lower surface plates is formed on an outer circumference portion; and a plurality of moving segments which is installed to move in a direction of inner and outer circumferences of one surface of the main body.
申请公布号 KR20140090475(A) 申请公布日期 2014.07.17
申请号 KR20130002574 申请日期 2013.01.09
申请人 LG SILTRON INCORPORATED 发明人 CHOI, KWANG HYUN
分类号 H01L21/304;B24B37/04 主分类号 H01L21/304
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