发明名称 CHEMICAL VAPOR DEPOSITION GROWTH OF GRAPHENE
摘要 <p>A process of growing graphene includes: (1) providing a metal substrate; (2) annealing the metal substrate up to a growth temperature for an annealing time period and in the presence of a non-reducing gas; and (3) introducing a gas mixture to grow graphene over the metal substrate. The gas mixture includes a first gas and a second gas that is a carbon-containing precursor, a molar ratio of the first gas and the second gas is at least 100, and introducing the gas mixture is carried out at a pressure up to 100 mbar.</p>
申请公布号 WO2014110170(A1) 申请公布日期 2014.07.17
申请号 WO2014US10733 申请日期 2014.01.08
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 DUAN, XIANGFENG;ZHOU, HAILONG
分类号 C01B31/02;B82B1/00;B82B3/00 主分类号 C01B31/02
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