| 摘要 |
PROBLEM TO BE SOLVED: To enable a substrate surface to be cleaned with high cleanliness and efficiently by optimally supplying a fresh cleaning liquid to an area to be cleaned of the substrate surface in contact with a roll cleaning member even if a surface characteristic is hydrophobic when cleaning the surface of the substrate which rotates horizontally by bringing the roll cleaning member into contact with the surface.SOLUTION: A substrate cleaning device comprises: a first chemical supply nozzle 60 composed of a nozzle for supplying a chemical toward a one-side area of a substrate so as to cause the chemical to be in contact with the substrate W in a first contact region 60a which extends in a lengthy shape; a second chemical supply nozzle 62 composed of a nozzle for supplying a chemical toward the one-side area of the substrate so as to cause the chemical to be in contact with the substrate in a second contact region 62a which extends elliptically on an upstream side of the first contact region along a rotational direction of the substrate; and a rinse agent supply nozzle 64 arranged so as to cause a rinse agent to be in contact with the substrate on an upstream side of the second contact region along the rotational direction of the substrate. |
