发明名称 Method and System for Universal Target Based Inspection and Metrology
摘要 Universal target based inspection drive metrology includes designing a plurality of universal metrology targets measurable with an inspection tool and measurable with a metrology tool, identifying a plurality of inspectable features within at least one die of a wafer using design data, disposing the plurality of universal targets within the at least one die of the wafer, each universal target being disposed at least proximate to one of the identified inspectable features, inspecting a region containing one or more of the universal targets with an inspection tool, identifying one or more anomalistic universal targets in the inspected region with an inspection tool and, responsive to the identification of one or more anomalistic universal targets in the inspected region, performing one or more metrology processes on the one or more anomalistic universal metrology targets with the metrology tool.
申请公布号 US2014199791(A1) 申请公布日期 2014.07.17
申请号 US201314083126 申请日期 2013.11.18
申请人 KLA-Tencor Corporation 发明人 Park Allen;Chang Ellis;Adel Michael;Bhaskar Kris;Levy Ady;Widmann Amir;Wagner Mark;Rong Songnian
分类号 H01L21/66;G06F17/50 主分类号 H01L21/66
代理机构 代理人
主权项 1. A method for in-die metrology comprising: designing a plurality of universal metrology targets measurable with an inspection tool and measurable with a metrology tool; identifying a plurality of inspectable features within at least one die of a wafer using design data; disposing the plurality of universal targets within the at least one die of the wafer, each universal target being disposed at least proximate to one of the identified inspectable features; inspecting a region containing one or more of the universal targets with an inspection tool; identifying one or more anomalistic universal targets in the inspected region with an inspection tool; and responsive to the identification of one or more anomalistic universal targets in the inspected region, performing one or more metrology processes on the one or more anomalistic universal metrology targets with the metrology tool.
地址 Milpitas CA US